Hitachi, Ltd.

Seishiro Sato

Tomoyuki Miyata

Takashi Yamamoto

Mitsuru Ohnuma

Toshihiko Wada

Kazunori Hasimoto

Toshihiro Furuya

Yasushi Saito

Processing machine for electron beam lithography system

Controller for semi-conductor processing machine

A beam of electrically charged particles for illuminating a specimen is deflected by a deflection means so that the specimen is scanned with the beam bi-dimensionally. The information signal thus produced by the specimen is detected by a detector means and fed to a display apparatus incorporating therein another deflection means. The information signal is deflected by the latter deflection means to scan the display screen and is displayed thereon as an information image. A wave form of a signal produced in the latter deflection means is detected by a wave form detector means, the output of which is applied to the first mentioned deflection means to thereby deflect the electrically charged particle beam with a signal having a wave form similar to the detected one.

Apparatus for displaying image produced by electrically charged particle

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Hitachi, Japan

Seishiro Sato