Company Filing History:
Years Active: 2001
Title: Seishiro Ohya: Innovator in Infrared Emitting Devices
Introduction
Seishiro Ohya is a notable inventor based in Fujisawa, Japan. He has made significant contributions to the field of infrared technology, particularly in the development of high-performance infrared-emitting devices. His innovative approach has led to advancements that enhance thermal response characteristics and infrared emissivity.
Latest Patents
Ohya holds a patent for a "Process for producing infrared emitting device and infrared emitting device produced by the process." This patent outlines a method to manufacture an infrared-emitting element with superior performance. The process involves forming a bridge portion on a silicon element substrate, which is designed to have a thickness of 5 µm or less. By doping boron as an impurity through ion implantation, he achieves a high impurity concentration that maintains infrared emissivity even with a thinner bridge portion. The annealing process is conducted under specific conditions to activate the impurity layer, ensuring stable and enhanced doping concentration.
Career Highlights
Seishiro Ohya is associated with Anritsu Corporation, where he has applied his expertise in infrared technology. His work has been pivotal in advancing the capabilities of infrared-emitting devices, making them more efficient and effective for various applications.
Collaborations
Ohya has collaborated with notable colleagues, including Setsuo Kodato and Shiro Karasawa. Their combined efforts have contributed to the innovative developments in the field of infrared technology.
Conclusion
Seishiro Ohya's contributions to the development of infrared-emitting devices highlight his role as a key innovator in this technology. His patented processes and collaborations have paved the way for advancements that benefit various industries.