The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2001
Filed:
Jan. 29, 1998
Setsuo Kodato, Atsugi, JP;
Seishiro Ohya, Fujisawa, JP;
Shiro Karasawa, Fujisawa, JP;
Hiroyasu Yuasa, Atsugi, JP;
Kenji Akimoto, Yokosuka, JP;
Anritsu Corporation, Tokyo, JP;
Abstract
In order, to manufacture a high-performance infrared-emitting element having high-speed thermal response characteristics and a high infrared emissivity, a bridge (heat-generating) portion having a separation space is formed on a silicon element substrate. The bridge portion is formed to have a thickness of 5 &mgr;m or less by doping boron as an impurity by ion implantation with a concentration distribution peak value of 1.5×10,atoms/cm,or more, and performing annealing under predetermined conditions for activating the impurity layer. In the infrared-emitting element manufactured in this manner, even if the bridge portion is made thin to improve the thermal response characteristics, the infrared emissivity does not decrease because of a high impurity concentration, and a large temperature modulation width can be obtained. In doping boron as the impurity by ion implantation, the dose is preferably set to 3.0×10,ions/cm,or more. To activate the impurity layer upon doping boron, the annealing is performed in the nitrogen gas atmosphere at a temperature of 1,100° C. to 1,200° C. for 5 min to 40 min and further in the wet oxygen atmosphere for about 25 min to 40 min. As a result, the doping concentration of boron by ion implantation and the activation of the impurity layer can be stably increased and enhanced.