Company Filing History:
Years Active: 2017
Title: Seiko Hitomi: Innovator in CD-SEM Technology
Introduction
Seiko Hitomi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of shape estimation before shrinkage in resist patterns.
Latest Patents
Seiko Hitomi holds a patent for a "Method for estimating shape before shrink and CD-SEM apparatus." This invention involves a process where a length of a resist that shrinks when irradiated with an electron beam is measured. To achieve high accuracy in estimating the shape and dimensions of the resist before shrinkage, a shrink database is prepared. This database contains cross-sectional shape data obtained prior to electron beam irradiation, along with various models and data groups. The CD-SEM image of the resist pattern is then compared with the data in the shrink database to estimate and output the shape and dimensions of the pattern before shrinkage.
Career Highlights
Seiko Hitomi is associated with Hitachi High-Technologies Corporation, where he has been instrumental in advancing technologies related to electron beam measurement. His work has been pivotal in enhancing the accuracy of semiconductor manufacturing processes.
Collaborations
Seiko has collaborated with notable colleagues, including Tomoko Sekiguchi and Takeyoshi Ohashi, contributing to various projects that push the boundaries of semiconductor technology.
Conclusion
Seiko Hitomi's innovative work in the field of CD-SEM technology exemplifies the importance of precision in semiconductor manufacturing. His contributions continue to influence advancements in the industry.