Seiji Yasuda

Title: Seiji Yasuda: Innovator in Semiconductor Technology

Introduction

Seiji Yasuda is a prominent inventor based in Yokohama, Japan, known for his significant contributions to semiconductor technology. With a total of four patents to his name, Yasuda has developed innovative methods and devices that enhance the performance and efficiency of semiconductor components.

Latest Patents

One of Yasuda's latest patents is an evaluation method for semiconductor devices. This method involves applying a reverse bias voltage between an N-type substrate and a P-type region to form a depletion layer. The process includes scanning the surface of the semiconductor device with a light beam to induce an optical beam induced current (OBIC) across the junction. The OBIC intensity profile is then measured to determine the surface potential distribution of the semiconductor device. Another notable patent is for a semiconductor device that monolithically comprises a vertical MOSFET and a bipolar element. This device is designed to withstand high voltage while reducing series resistance, thanks to the formation of buried layers with varying impurity concentrations.

Career Highlights

Throughout his career, Seiji Yasuda has worked with notable companies such as Tokyo Shibaura Denki and Toshiba Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Yasuda has collaborated with esteemed colleagues, including Toshio Yonezawa and Yutaka Koshino. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the field.

Conclusion

Seiji Yasuda's work in semiconductor technology exemplifies the impact of innovation on modern electronics. His patents reflect a deep understanding of semiconductor principles and a commitment to advancing the industry.