Kawasaki, Japan

Seiji Todoroki

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Seiji Todoroki: Innovator in Resist Composition Technology

Introduction

Seiji Todoroki is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist composition technology, which is crucial in the manufacturing of semiconductors and microelectronics. His innovative work has led to the development of a unique resist composition that enhances the efficiency of pattern formation in various applications.

Latest Patents

Todoroki holds a patent for a resist composition, method of forming a resist pattern, and an acid diffusion-controlling agent. This resist composition generates an acid upon exposure, altering its solubility in a developing solution through the action of the acid. The composition includes a base material component whose solubility is modified by the acid, along with a compound represented by General Formula (d0). This formula incorporates a monovalent organic group and a divalent linking group, showcasing the complexity and innovation behind his work. He has 1 patent to his name.

Career Highlights

Seiji Todoroki has been associated with Tokyo Ohka Kogyo Co., Ltd., a leading company in the field of photoresist materials. His role in the company has allowed him to focus on advancing resist technology, contributing to the company's reputation for innovation and quality in the semiconductor industry.

Collaborations

Throughout his career, Todoroki has collaborated with notable colleagues, including Hiroto Yamazaki and Masahiro Shiosaki. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Seiji Todoroki's contributions to resist composition technology exemplify the spirit of innovation in the semiconductor industry. His work not only enhances manufacturing processes but also paves the way for future advancements in microelectronics.

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