Kanagawa, Japan

Seiji Iimura

This inventor holds 1 USPTO granted patent. Top assignee: Ebara Corporation. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiji Iimura. Retrieved from https://idiyas.com/inventor/seiji-iimura-7owfqk42

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Seiji Iimura: Innovator in Ozone-Scavenging Technology

Introduction

Seiji Iimura is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of ozone removal technology. His innovative approach addresses the challenges associated with conventional ozone-scavenging materials.

Latest Patents

Iimura holds a patent for an "Ozone removing material and method for preparing the same." The objective of this invention is to provide an effective ozone-scavenging material that can decompose and remove ozone at a low cost. The invention involves a unique method of supporting a metal with ozone-decomposing ability on an organic polymer base. This polymer base features a side chain with an ion exchange group, enhancing its effectiveness in ozone removal.

Career Highlights

Seiji Iimura is associated with Ebara Corporation, where he has been able to apply his expertise in developing innovative solutions. His work has focused on creating materials that can effectively address environmental challenges related to ozone.

Collaborations

Iimura has collaborated with notable colleagues such as Kazuyoshi Takeda and Kunio Fujiwara. Their combined efforts have contributed to advancements in the field of ozone-scavenging technologies.

Conclusion

Seiji Iimura's contributions to ozone removal technology highlight his innovative spirit and dedication to solving environmental issues. His patent reflects a significant advancement in the field, showcasing the potential for effective and low-cost solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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