This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2022-2025.
Company Filing History:
Years Active: 2022-2025
Title: Seiji Ide: Innovator in Plasma Processing Technology
Introduction
Seiji Ide is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding 2 patents that showcase his innovative methods.
Latest Patents
His latest patents include a method of etching a film and a plasma processing apparatus. This method involves etching a film on a substrate that consists of an underlying region, the film itself, and a mask. The process includes performing main etching through plasma etching, which exposes part of the underlying region. After the main etching, a protective layer is formed on the side wall surface of the mask, using a material different from that of the film. The method also incorporates over-etching on the film, which is again achieved through plasma etching.
Career Highlights
Seiji Ide is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing the techniques used in plasma processing.
Collaborations
He has collaborated with notable coworkers, including Chiju Hsieh and Kentaro Ishii, contributing to various projects that enhance the capabilities of plasma processing technologies.
Conclusion
Seiji Ide's innovative work in plasma processing technology and his contributions to the field through his patents highlight his role as a key inventor in the industry. His advancements continue to influence the development of semiconductor manufacturing processes.