This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Materials Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Seiji Harada: Innovator in Polishing Technology
Introduction
Seiji Harada is a notable inventor based in Omiya, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent that enhances the efficiency of polishing processes.
Latest Patents
Harada holds a patent for a "Polishing apparatus, polishing method and method of conditioning polishing pad." This invention features a polishing apparatus with multiple polishing and cleaning stations that are alternately arranged. The apparatus includes an arm that holds and transfers materials being polished between these stations. Each cleaning station is equipped with a retainer stand and a cleaning device, ensuring thorough cleaning of both the material being polished and the polishing head.
Career Highlights
Seiji Harada is associated with Mitsubishi Materials Corporation, where he has applied his expertise in polishing technology. His work has led to advancements in the efficiency and effectiveness of polishing methods, benefiting various industries that rely on precision polishing.
Collaborations
Harada has collaborated with notable coworkers, including Tatsunori Kobayashi and Yasuyuki Ogata. Their combined efforts have contributed to the development of innovative solutions in the polishing sector.
Conclusion
Seiji Harada's contributions to polishing technology through his patent and work at Mitsubishi Materials Corporation highlight his role as an influential inventor in this field. His innovations continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile