This inventor holds 2 USPTO granted patents. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1994-2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kyoto, JP (1994)
- Shiga, JP (2000)
Company Filing History:
Years Active: 1994-2000
Title: Seiichiro Sato: Innovator in Substrate Processing and Silicon Evaluation
Introduction
Seiichiro Sato is a notable inventor based in Shiga, Japan. He has made significant contributions to the fields of substrate processing and silicon thin film evaluation. With a total of 2 patents, Sato's work has advanced the technology used in these areas.
Latest Patents
One of Seiichiro Sato's latest patents is an "Apparatus for processing substrates." This innovative apparatus allows substrates held in a common carrier to be transferred horizontally to an exclusive carrier, which can rotate on a horizontal axis. By rotating the exclusive carrier, the substrates can be turned from a horizontal to a vertical attitude, facilitating a simple and speedy transfer to a processing part. This design enhances the efficiency of substrate processing.
Another significant patent is the "Method of and apparatus for evaluating crystal rate in silicon thin film." In this invention, ultraviolet light is applied to both a single-crystalline silicon substrate and a silicon thin film sample. The reflection intensity ratio is analyzed to evaluate the degree of non-crystallization of the silicon thin film. This method provides a reliable index for assessing the quality of silicon films.
Career Highlights
Seiichiro Sato is currently employed at Dainippon Screen Mfg. Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in improving processes related to substrate handling and silicon evaluation.
Collaborations
Sato has collaborated with talented coworkers such as Izuru Iseki and Yusuke Muraoka. Their combined expertise has contributed to the successful development of Sato's patents and innovations.
Conclusion
Seiichiro Sato's contributions to substrate processing and silicon evaluation demonstrate his commitment to innovation in technology. His patents reflect a deep understanding of the complexities involved in these fields, and his work continues to influence advancements in substrate processing techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile