Company Filing History:
Years Active: 1986-1994
Title: Innovative Contributions of Seiichiro Kawamura in Semiconductor Technology
Introduction
Seiichiro Kawamura, an accomplished inventor based in Tokyo, Japan, has significantly contributed to the field of semiconductor technology. With a portfolio of five patents, his work focuses on advanced fabrication methods for semiconductor devices, particularly those involving silicon-on-insulator (SOI) technology.
Latest Patents
Kawamura's latest innovations include a cutting-edge method for fabricating an SOI device in alignment with a device region. This method involves forming a first alignment mark on a semiconductor substrate, followed by creating a diffusion region defined by this mark. His intricate process of recrystallizing the semiconductor layer demonstrates a remarkable approach to achieving a single crystal semiconductor layer that shows precision in alignment and functionality. Another notable patent is his fabrication method of a semiconductor integrated circuit that efficiently integrates different types of semiconductor devices using a silicon nitride film as a selective oxidation mask, illustrating his expertise in multi-layer device architecture.
Career Highlights
Seiichiro Kawamura has made notable strides in the semiconductor industry while working for Fujitsu Corporation. His innovative patents reflect a profound understanding of semiconductor physics and engineering, allowing for advancements in both efficiency and performance in semiconductor devices.
Collaborations
Throughout his career, Kawamura has collaborated with esteemed colleagues such as Matsuo Takaoka and Nobuo Sasaki. Their collective efforts have led to significant breakthroughs in semiconductor manufacturing techniques, contributing to the evolution of reliable and effective electronic components in various applications.
Conclusion
Seiichiro Kawamura stands out as an influential inventor in the semiconductor industry. His patents signify not just technical innovation but also a vision for the future of semiconductor technology, making substantial impacts through collaborations and advancements in fabrication methods. His work continues to influence the development of efficient and advanced electronic devices.