Ohmi, Japan

Seiichi Watanabe


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Ohmimachi, JP (1980)
  • Ohmi, JP (1978 - 1985)
  • Niigata, JP (1987)

Company Filing History:


Years Active: 1978-1987

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Seiichi Watanabe

Introduction

Seiichi Watanabe is a notable inventor based in Ohmi, Japan. He has made significant contributions to the field of chemistry, particularly in the development of catalysts and processes for chemical synthesis. With a total of 7 patents to his name, Watanabe's work has had a considerable impact on various industrial applications.

Latest Patents

Watanabe's latest patents include innovative advancements such as substituted cyclopentadienyl cobalt complexes and the synthesis of pyridine. His work on a complex of an electron-attracting group-substituted η⁵-cyclopentadienylcobalt with a polyene or an acetylene serves as a catalyst for synthesizing substituted pyridine from an alkyne and a nitrile. Additionally, he has developed a process for producing chloroprene by reacting 3,4-dichlorobutene-1 in an aqueous solution of an alkali metal hydroxide, utilizing furfuryl alcohol and tetrahydrofurfuryl alcohol at controlled temperatures.

Career Highlights

Throughout his career, Watanabe has worked with prominent companies such as Denki Kagaku Kogyo Kabushiki Kaisha and Rikagaku Kenkyusyo. His expertise in chemical synthesis and catalysis has positioned him as a valuable asset in the industry.

Collaborations

Watanabe has collaborated with notable colleagues, including Higashi Ito and Itsuo Tabata. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Seiichi Watanabe's innovative work in the field of chemistry has led to significant advancements in catalysis and chemical processes. His contributions continue to influence the industry and inspire future research in the field.

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