The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1978
Filed:
Jan. 22, 1975
Applicant:
Inventors:
Takashi Kadowaki, Ohmi, JP;
Michio Nishimura, Ohmi, JP;
Seiichi Watanabe, Ohmi, JP;
Koichi Abe, Ohmi, JP;
Assignee:
Denki Kagaku Kogyo Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
260655 ;
Abstract
Chloroprene having a little content of acetaldehyde is produced by dehydrochlorination of 3,4-dichlorobutene-1 in the presence of an aqueous solution of an alkali metal hydroxide by treating with an ammonium ion donor during or after the dehydrochlorination or in both the steps.
Quick Actions:
Kadowaki, Takashi. (1978). Process for producing chloroprene monomer having a little content of (U.S. Patent No. 4130596). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4130596
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile