This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Seiichi Kondo: Innovator in Metal Polishing Technology
Introduction
Seiichi Kondo is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of metal polishing technology. His innovative approach has led to the development of a unique polishing liquid that enhances the efficiency and reliability of metal polishing processes.
Latest Patents
Kondo holds a patent for a "Polishing liquid for metal and polishing method." This invention relates to a metal polishing liquid designed for polishing at least a part of metal in a substrate. The formulation includes a metal solubilizer containing amino acids, compounds with a benzotriazole skeleton, and an acrylic acid polymer with a weight average molecular weight of 10,000 or more. The mass ratio between the benzotriazole compounds and the acrylic acid polymer is maintained between 1:1 to 1:5. This innovative polishing liquid allows for high polishing rates while minimizing etching rates, enabling the formation of embedded patterns with greater reliability. Kondo has 1 patent to his name.
Career Highlights
Seiichi Kondo is associated with Hitachi Chemical Company, Ltd., where he has been instrumental in advancing metal polishing technologies. His work has significantly impacted the manufacturing processes within the industry, showcasing his expertise and dedication to innovation.
Collaborations
Kondo has collaborated with notable colleagues, including Yasuhiro Ichige and Kouji Haga. Their combined efforts have contributed to the development of advanced technologies in the field of metal polishing.
Conclusion
Seiichi Kondo's contributions to metal polishing technology exemplify the importance of innovation in industrial processes. His patented polishing liquid represents a significant advancement, enhancing both efficiency and reliability in metal polishing applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile