Hsinchu, Taiwan

Sei-Da Chen

This inventor holds 1 USPTO granted patent. Top assignee: National Synchrotron Radiation Research Center. Active years: 2022.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Sei-Da Chen: Innovator in Electron Beam Polarization Technology

Introduction

Sei-Da Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electron beam technology, particularly in the development of devices that enhance the performance of synchrotron storage rings and free electron lasers.

Latest Patents

One of his notable patents is titled "Fast-switch undulator and method for polarizing electron beam." This invention focuses on an undulator designed for synchrotron storage rings or free electron lasers. It is particularly remarkable for its ability to switch polarization modes rapidly without relying on mechanical transmission mechanisms. This innovation stands in contrast to the elliptically polarized undulator (EPU) of APPLE II, conceived by Dr. S. Sasaki. The undulator developed by Chen utilizes permanent magnets to drive the four magnetic pole arrays, allowing for quick polarization mode switching. Additionally, he provides a novel method for polarizing the electron beam.

Career Highlights

Sei-Da Chen is affiliated with the National Synchrotron Radiation Research Center, where he continues to advance research in electron beam technologies. His work has garnered attention for its potential applications in various scientific fields.

Collaborations

Throughout his career, Chen has collaborated with esteemed colleagues, including Ching-Shiang Hwang and Ting-Yi Chung. These partnerships have contributed to the success and impact of his innovations.

Conclusion

Sei-Da Chen's contributions to the field of electron beam technology, particularly through his patented innovations, highlight his role as a key figure in advancing scientific research. His work continues to influence the development of more efficient and effective technologies in this area.

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