The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

May. 29, 2019
Applicant:

National Synchrotron Radiation Research Center, Hsinchu, TW;

Inventors:

Ching-Shiang Hwang, Hsinchu, TW;

Sei-Da Chen, Hsinchu, TW;

Ting-Yi Chung, Hsinchu, TW;

Jyh-Chyuan Jan, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 7/04 (2006.01); H05H 13/04 (2006.01); H01S 3/09 (2006.01);
U.S. Cl.
CPC ...
H05H 7/04 (2013.01); H01S 3/0903 (2013.01); H05H 13/04 (2013.01); H05H 2007/041 (2013.01);
Abstract

An undulator is adapted to a synchrotron storage ring or free electron lasers (FEL), especially to an undulator capable of switching polarization mode rapidly. In comparison with the EPU (elliptically polarized undulator) of APPLE II (Advanced Planar Polarized Light Emitter II) which conceived by Dr. S. Sasaki, the provided undulator does not use mechanical transmission mechanisms to drive the four magnetic pole arrays composed of permanent magnets. Hence, the polarization mode can be switched rapidly. Moreover, a polarization method of electron beam is also provided.


Find Patent Forward Citations

Loading…