Seetharaman Ramachandran

Title: Seetharaman Ramachandran: Innovator in Plasma Technology

Introduction

Seetharaman Ramachandran is a prominent inventor based in Fremont, California, known for his significant contributions to plasma technology. With a portfolio of two patents, he has made notable advancements in processes involving plasma etching chambers, contributing to innovations in semiconductor manufacturing.

Latest Patents

Seetharaman's latest inventions include a "System, method and apparatus for RF power compensation in plasma etch chamber." This invention focuses on characterizing the no plasma performance slope of a target plasma chamber and applying a specific plasma recipe to enhance process efficiency. The method calculates an adjusted power set point that optimally matches power delivery between different plasma chambers, ensuring high efficiency and improved performance.

Another pivotal patent by Seetharaman is the "Method and apparatus of halogen removal." This process involves transporting a wafer into a vacuum-formed entrance load lock chamber, processing it to form halogen residue, followed by a degas step treated with UV light and specific gas flows. This innovation helps in effectively removing halogen residues, which is crucial for the overall quality of the processed wafer.

Career Highlights

Seetharaman Ramachandran is currently employed at Lam Research Corporation, a leading company in the field of semiconductor equipment. His expertise and innovations greatly enhance the technological capabilities of the company and contribute to advancements in the semiconductor industry.

Collaborations

Throughout his career, Seetharaman has collaborated with notable colleagues, including Shang-I Chou and Harmeet Singh. These collaborations have fostered a creative environment contributing to cutting-edge solutions in the field of plasma technology.

Conclusion

Seetharaman Ramachandran stands out as a visionary inventor, committed to advancing technology in plasma etching and semiconductor manufacturing. His patents reflect a dedication to enhancing process efficiency and purity in wafer processing, positioning him as a key figure in the evolution of this critical technology.