Location History:
- Rijswijk, NL (2003)
- München, DE (2007)
Company Filing History:
Years Active: 2003-2007
Title: Sebastian Oestreich: Innovator in Multilayer Systems
Introduction
Sebastian Oestreich is a notable inventor based in Munich, Germany. He has made significant contributions to the field of multilayer systems, particularly in the development of systems used for mirrors in the extreme ultraviolet wavelength range. With a total of two patents to his name, Oestreich's innovations have the potential to revolutionize applications in semiconductor lithography.
Latest Patents
Oestreich's latest patents focus on multilayer systems that incorporate advanced protective layer technologies to combat contamination and oxidation. His patents, titled "Multilayer system with protecting layer system and production method," describe multilayer systems designed to maintain consistently high reflectivity over extended periods, even when exposed to harsh environments. The protective layers in these systems consist of materials such as iridium, ruthenium, aluminium oxide, silicon carbide, molybdenum carbide, carbon, titanium nitride, and titanium dioxide. The innovative production method involves direct, ion-beam-supported growth of the respective layers, enhancing their durability and cleaning capabilities without compromising reflectivity. These advancements make the multilayer systems particularly suitable for applications in semiconductor lithography within the soft X-ray and extreme ultraviolet wavelength ranges.
Career Highlights
Throughout his career, Oestreich has collaborated with prestigious organizations, including Carl Zeiss Stiftung and Carl Zeiss SMT AG. His work in these companies has allowed him to advance his innovative projects in multilayer technology, leading to significant advancements in optical materials.
Collaborations
In addition to his employment, Sebastian Oestreich has worked alongside esteemed colleagues such as Frederik Bijkerk and Eric Louis. These collaborations have enabled him to join forces with other experts in the field, fostering innovation and the sharing of valuable knowledge.
Conclusion
Sebastian Oestreich's contributions to the field of multilayer systems underscore his role as an innovator in optical technology. His patents highlight the importance of developing high-performance materials that can endure demanding operational conditions, thereby paving the way for future advancements in semiconductor lithography and related fields. As his innovations continue to gain recognition, Oestreich reaffirms the impact that dedicated inventors can have on advancing technology.