Sebastian Giessmann

Title: Innovations of Sebastian Giessmann

Introduction

Sebastian Giessmann is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to semiconductor inspection methods.

Latest Patents

Giessmann's latest patents include a semiconductor inspecting method for ensuring scrubbing length on a pad. This method involves several steps, starting with defining a first position of a probe needle from above. A wafer, which includes at least a pad, is then placed on a wafer chuck of a semiconductor inspecting system. Following this, a relative vertical movement between the probe needle and the pad is executed using the driving system of the semiconductor inspecting system to generate a scrubbing length on the pad. The method also includes recognizing whether the scrubbing length meets a preset value through a vision system, after which the relative vertical movement is halted. Another patent focuses on a semiconductor inspecting method that similarly defines the position of the probe needle and involves recognizing a minimum change in position corresponding to the first position.

Career Highlights

Throughout his career, Giessmann has demonstrated a commitment to advancing semiconductor inspection technologies. His work has been instrumental in improving the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Giessmann has collaborated with notable colleagues such as Volker Hansel and Frank Fehrmann, contributing to a dynamic work environment that fosters innovation.

Conclusion

Sebastian Giessmann's contributions to semiconductor technology through his patents reflect his dedication to innovation in the field. His work continues to influence the industry and pave the way for future advancements.