This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Asm International N.v.. Active years: 2016.
Company Filing History:
Years Active: 2016
Title: Innovations of Sebastiaan E Van Nooten
Introduction
Sebastiaan E Van Nooten is a notable inventor based in Bilthoven, Netherlands. He has made significant contributions to the field of atomic layer deposition, which is crucial for various applications in materials science and engineering. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of film deposition processes.
Latest Patents
Sebastiaan holds a patent for an "Apparatus and method for high-throughput atomic layer deposition." This invention describes an atomic layer deposition apparatus designed for depositing a film in a continuous manner. The apparatus features a process tunnel that extends in a transport direction and is bounded by at least a first and a second wall. These walls are mutually parallel and accommodate a flat substrate between them. Additionally, the apparatus includes a transport system that moves a train of substrates or a continuous substrate in tape form through the tunnel. Notably, the first wall of the process tunnel is equipped with multiple gas injection channels that are sequentially connected to various gas sources, creating distinct zones for the deposition process.
Career Highlights
Sebastiaan is currently associated with ASML Holding N.V., a leading company in the semiconductor industry. His work focuses on advancing technologies that improve the efficiency and effectiveness of atomic layer deposition processes. His innovative contributions have positioned him as a key figure in the field.
Collaborations
Sebastiaan has collaborated with several professionals in his field, including Ernst H A Granneman. These collaborations have fostered advancements in atomic layer deposition technologies and have contributed to the overall progress in the industry.
Conclusion
Sebastiaan E Van Nooten's innovative work in atomic layer deposition exemplifies the impact of dedicated inventors in advancing technology. His patent and contributions to ASML Holding N.V. highlight the importance of innovation in the semiconductor industry.