Suwon, South Korea

Se Woung Oh

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Se Woung Oh. Retrieved from https://idiyas.com/inventor/se-woung-oh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Se Woung Oh: Innovator in Semiconductor Fabrication

Introduction

Se Woung Oh is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in device fabrication.

Latest Patents

Se Woung Oh holds a patent for a "Method for fabricating semiconductor device." This patent describes a comprehensive process that includes forming an active pattern on a substrate, stacking sacrificial and semiconductor layers, and etching to create source/drain trenches. The method enhances the efficiency and effectiveness of semiconductor device production.

Career Highlights

Se Woung Oh is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work focuses on developing cutting-edge semiconductor technologies that are crucial for modern electronics. With 1 patent to his name, he continues to contribute to the advancement of the industry.

Collaborations

Throughout his career, Se Woung Oh has collaborated with notable colleagues, including Hyung Dong Kim and Sang Mo Koo. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Se Woung Oh's contributions to semiconductor fabrication exemplify the spirit of innovation in technology. His work at Samsung Electronics Ltd. and his patented methods are vital to the ongoing evolution of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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