This inventor holds 1 USPTO granted patent. Top assignee: Industry-University Cooperation Foundation Sogang University. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Se Jung Park: Innovator in Reactive Cyclodextrin Derivatives
Introduction
Se Jung Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of materials science, particularly through his innovative work on reactive cyclodextrin derivatives. His research focuses on developing materials with unique properties that can be utilized in various applications.
Latest Patents
Se Jung Park holds 1 patent for his invention titled "Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same." This invention involves a reactive nanoparticular cyclodextrin derivative that serves as a porogen and a low dielectric matrix. The materials produced exhibit excellent mechanical properties and uniformly distributed nanopores. The ultralow dielectric film created from this invention has a porosity of 51% and a dielectric constant of 1.6, making it highly valuable for electronic applications.
Career Highlights
Se Jung Park is affiliated with the Industry-University Cooperation Foundation at Sogang University. His work at this institution has allowed him to engage in cutting-edge research and development in the field of materials science. His innovative approach has positioned him as a key figure in the advancement of low dielectric materials.
Collaborations
Throughout his career, Se Jung Park has collaborated with notable colleagues, including Hee-Woo Rhee and Do Young Yoon. These collaborations have further enhanced his research and contributed to the development of new technologies in his field.
Conclusion
Se Jung Park is a distinguished inventor whose work on reactive cyclodextrin derivatives has the potential to revolutionize materials used in various industries. His contributions to the field of materials science are noteworthy and continue to inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile