The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Dec. 14, 2004
Hee-woo Rhee, Seoul, KR;
DO Young Yoon, Seoul, KR;
Kook Heon Char, Seoul, KR;
Jin-kyu Lee, Seoul, KR;
Bongjin Moon, Goyang-si, KR;
Sung-kyu Min, Seoul, KR;
SE Jung Park, Seoul, KR;
Jae-jin Shin, Seoul, KR;
Hee-Woo Rhee, Seoul, KR;
Do Young Yoon, Seoul, KR;
Kook Heon Char, Seoul, KR;
Jin-Kyu Lee, Seoul, KR;
Bongjin Moon, Goyang-si, KR;
Sung-Kyu Min, Seoul, KR;
Se Jung Park, Seoul, KR;
Jae-Jin Shin, Seoul, KR;
Abstract
This invention is related to a reactive nanoparticular cyclodextrin derivative useful as a porogen and a low dielectric matrix, with excellent mechanical properties and uniformly distributed nanopores, manufactured by sol-gel reaction of the above reactive cyclodextrin. Furthermore, this invention also is related to an ultralow dielectric film, with uniformly distributed nanopores, a relatively high porosity of 51%, and a relatively low dielectric constant of 1.6, manufactured by thin-filming of the conventional organic or inorganic silicate precursor by using the above reactive nanoparticular cyclodextrin derivative as a porogen.