Company Filing History:
Years Active: 2011
Title: **Innovator Se-Hwan Jung: Pioneering Advances in Photoresist Technology**
Introduction
Se-Hwan Jung is a prominent inventor based in Hwaseong-si, South Korea, known for his groundbreaking work in the field of photoresist technology. His contributions to innovations in this area have led to the granting of two significant patents, showcasing his expertise and creativity within the industry.
Latest Patents
Se-Hwan Jung's latest patents include:
1. **Composition for removing photoresist and method of manufacturing an array substrate using the same**
This invention presents a composition for effectively removing photoresist, featuring an amine compound with cyclic amine and/or diamine, a glycol ether compound, a corrosion inhibitor, and a polar solvent. The innovative aspect of this composition is the inclusion of a stripping promoter, enhancing the efficiency of the removal process. Furthermore, it details a method for manufacturing an array substrate utilizing this advanced composition.
2. **Composition for photoresist stripper and method of fabricating thin film transistor array substrate**
This patent describes a composition used for photoresist stripping and a method for fabricating a thin film transistor array substrate. The composition comprises various components, including 5-30 weight % of a chain amine compound, 0.5-10 weight % of a cyclic amine compound, 10-80 weight % of a glycol ether compound, 5-30 weight % of distilled water, and 0.1-5 weight % of a corrosion inhibitor. These carefully selected ingredients contribute to the effectiveness and efficiency of the fabrication process.
Career Highlights
Se-Hwan Jung is associated with Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung involves developing innovative solutions that drive advancements in electronic materials and processes, particularly in semiconductor technology.
Collaborations
Throughout his career, Se-Hwan Jung has collaborated with notable colleagues, including Jong-Hyun Choung and Hong-Sick Park. These partnerships have fostered a rich exchange of ideas and expertise, culminating in the advancement of cutting-edge technologies in their respective fields.
Conclusion
As an inventor, Se-Hwan Jung embodies the spirit of innovation, continually pushing the boundaries of technology. His recent patents in photoresist solutions highlight his dedication and impact on the industry, promising to influence future developments within the realm of semiconductor manufacturing. His contributions are invaluable as the field evolves to meet the demands of modern technology.