The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2011
Filed:
Nov. 26, 2008
Jong-hyun Choung, Hwaseong-si, KR;
Hong-sick Park, Suwon-si, KR;
Sun-young Hong, Yongin-si, KR;
Bong-kyun Kim, Incheon, KR;
Byeoung-jin Lee, Yongin-si, KR;
Byung-uk Kim, Hwaseong-si, KR;
Jong-hyun Jeong, Hwaseong-si, KR;
Suk-il Yoon, Hwaseong-si, KR;
Sung-gun Shin, Hwaseong-si, KR;
Soon-beom Huh, Hwaseong-si, KR;
Se-hwan Jung, Hwaseong-si, KR;
Doo-young Jang, Hwaseong-si, KR;
Jong-Hyun Choung, Hwaseong-si, KR;
Hong-Sick Park, Suwon-si, KR;
Sun-Young Hong, Yongin-si, KR;
Bong-Kyun Kim, Incheon, KR;
Byeoung-Jin Lee, Yongin-si, KR;
Byung-Uk Kim, Hwaseong-si, KR;
Jong-Hyun Jeong, Hwaseong-si, KR;
Suk-Il Yoon, Hwaseong-si, KR;
Sung-Gun Shin, Hwaseong-si, KR;
Soon-Beom Huh, Hwaseong-si, KR;
Se-Hwan Jung, Hwaseong-si, KR;
Doo-Young Jang, Hwaseong-si, KR;
Abstract
A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.