The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2011

Filed:

Sep. 21, 2009
Applicants:

Jong-hyun Choung, Hwaseong-si, KR;

Bong-kyun Kim, Incheon, KR;

Hong-sick Park, Suwon-si, KR;

Sun-young Hong, Yongin-si, KR;

Young-joo Choi, Jeollanam-do, KR;

Byeong-jin Lee, Seoul, KR;

Nam-seok Suh, Yongin-si, KR;

Byung-uk Kim, Hwaseong-si, KR;

Suk-il Yoon, Hwaseong-si, KR;

Jong-hyun Jeong, Hwaseong-si, KR;

Sung-gun Shin, Hwaseong-si, KR;

Soon-beom Huh, Hwaseong-si, KR;

Se-hwan Jung, Hwaseong-si, KR;

Doo-young Jang, Hwaseong-si, KR;

Sun-joo Park, Hwaseong-si, KR;

Oh-hwan Kweon, Hwaseong-si, KR;

Inventors:

Jong-Hyun Choung, Hwaseong-si, KR;

Bong-Kyun Kim, Incheon, KR;

Hong-Sick Park, Suwon-si, KR;

Sun-Young Hong, Yongin-si, KR;

Young-Joo Choi, Jeollanam-do, KR;

Byeong-Jin Lee, Seoul, KR;

Nam-Seok Suh, Yongin-si, KR;

Byung-Uk Kim, Hwaseong-si, KR;

Suk-Il Yoon, Hwaseong-si, KR;

Jong-Hyun Jeong, Hwaseong-si, KR;

Sung-Gun Shin, Hwaseong-si, KR;

Soon-Beom Huh, Hwaseong-si, KR;

Se-Hwan Jung, Hwaseong-si, KR;

Doo-Young Jang, Hwaseong-si, KR;

Sun-Joo Park, Hwaseong-si, KR;

Oh-Hwan Kweon, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/062 (2006.01); H01L 31/113 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.


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