Taoyuan City, Taiwan

Scott Yeh

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Scott Yeh. Retrieved from https://idiyas.com/inventor/scott-yeh-d16gmin1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Scott Yeh - Innovator in Semiconductor Technology

Introduction

Scott Yeh is a prominent inventor based in Taoyuan City, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs and patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Scott Yeh holds a patent for a Hybrid Fin-dielectric semiconductor device. This invention relates to a semiconductor device that features a hybrid fin-dielectric region. The device includes a substrate, a source region, and a drain region that are laterally separated by the hybrid fin-dielectric (HFD) region. A gate electrode is positioned above the HFD region, which consists of multiple fins covered by a dielectric material. These fins are separated from the source and drain regions by the dielectric, showcasing a novel approach to semiconductor design.

Career Highlights

Scott Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His role at this leading semiconductor manufacturer allows him to apply his innovative ideas and contribute to the advancement of semiconductor technology. His expertise and patent portfolio reflect his commitment to pushing the boundaries of what is possible in this field.

Collaborations

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Conclusion

Scott Yeh's contributions to semiconductor technology, particularly through his patented innovations, highlight his role as a key figure in the industry. His work continues to influence the development of advanced semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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