Company Filing History:
Years Active: 2001-2007
Title: **Inventor Spotlight: Scott T. Barusso**
Introduction
Scott T. Barusso is a distinguished inventor based in Gloucester, MA, recognized for his contributions to the field of ion beam implantation technology. With two patents to his name, Barusso has made significant advancements that enhance the efficiency and functionality of ion implanters, which are essential in industries such as semiconductor manufacturing.
Latest Patents
Barusso's latest patents reflect his innovative spirit and technical expertise. The first, titled "Bellows liner for an ion beam implanter," focuses on improving the implantation process. It describes an ion beam implanter that includes a flexible bellows connecting the implantation station to the beam forming and directing apparatus. This design allows for the pivoting of the implantation station, thereby adjusting the orientation of workpieces relative to the ion beam. A key feature of this invention is a replaceable, flexible bellows liner that minimizes the accumulation of implantation byproducts.
His second patent, "Toroidal filament for plasma generation," addresses the efficiency of ion sources. This invention introduces a filament with a thermally emissive central portion coiled in a toroidal shape, made from materials such as tantalum and tungsten. The unique construction allows for the establishment of closed-loop magnetic field lines when electrical current flows through, effectively confining emitted electrons. This advancement is pivotal in enhancing the performance of ion implanters.
Career Highlights
Scott T. Barusso's career is marked by his association with Axcelis Technologies, Inc., a leading company in the semiconductor equipment industry. His work has not only led to the successful registration of patents but has also played a crucial role in the development of innovative technologies that shape modern manufacturing processes.
Collaborations
Throughout his career, Barusso has collaborated with notable associates, including Jiong Chen and Ronald A. Capodilupo. Their joint efforts have contributed to the successful development and refinement of technologies in ion implantation systems, further emphasizing the importance of teamwork in pushing the boundaries of innovation.
Conclusion
Scott T. Barusso exemplifies the innovative spirit within the field of ion beam technology. His impactful patents and collaborations have paved the way for advancements that benefit various industries. As he continues to work at Axcelis Technologies, Inc., the contributions of Barusso are likely to influence the future of semiconductor manufacturing and ion implantation processes for years to come.