The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Oct. 01, 2004
Lyudmila Stone, Lynnfield, MA (US);
Scott T. Barusso, Gloucester, MA (US);
Dale K. Stone, Lynnfield, MA (US);
Alexander S. Perel, Danvers, MA (US);
Lyudmila Stone, Lynnfield, MA (US);
Scott T. Barusso, Gloucester, MA (US);
Dale K. Stone, Lynnfield, MA (US);
Alexander S. Perel, Danvers, MA (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
An ion beam implanter includes ion beam forming and directing apparatus and an implantation station where workpieces are implanted with ions from an ion beam. The beam travels along an evacuated path from an ion source to the implantation station. A flexible bellows couples the implantation station to the beam forming and directing apparatus permitting the implantation station to be pivoted with respect to the beam forming and directing apparatus and thereby change an implantation orientation of the workpieces with respect to the ion beam. A replaceable, flexible bellows liner is disposed within an interior region of the bellows to reduce the volume of implantation byproducts deposited on an interior surface of the bellows.