Elk Grove, CA, United States of America

Scott Siers


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Scott Siers - Innovator in Semiconductor Technology

Introduction

Scott Siers is a notable inventor based in Elk Grove, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of die rotation and reticle stitching. His innovative work has implications for improving device interconnects in complex computing systems.

Latest Patents

Scott Siers holds a patent titled "Simulating die rotation to minimize area overhead of reticle stitching for stacked dies." This patent discusses compute complexes, base dies, and methods related to leveraging reticle stitching for enhanced device interconnects. The invention describes a base die that includes first and second regions with device layers, lower-level metallization layers, and through vias fabricated using the same reticles. In the first region, a subset of the through vias is contacted by higher metallization layers, while in the second region, a distinct subset is contacted by higher metallization layers. This unique routing through vias allows for shared layouts and relative locations in both regions.

Career Highlights

Scott Siers is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has positioned him as a key player in advancing technology in the industry. With a focus on innovative solutions, he continues to contribute to the development of cutting-edge semiconductor technologies.

Collaborations

Scott has collaborated with notable colleagues, including Satish K Damaraju and Christopher M Pelto. These collaborations have fostered an environment of innovation and creativity, leading to advancements in semiconductor technology.

Conclusion

Scott Siers is a prominent inventor whose work in semiconductor technology has made a significant impact. His patent on die rotation and reticle stitching showcases his innovative approach to solving complex challenges in the field. Through his contributions at Intel Corporation, he continues to drive advancements in technology.

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