Boise, ID, United States of America

Scott Meyer


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2010

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2 patents (USPTO):Explore Patents

Title: Scott Meyer: Innovator in Substrate Processing Technology

Introduction

Scott Meyer is a notable inventor based in Boise, ID (US), recognized for his contributions to substrate processing technology. He holds 2 patents that focus on improving the efficiency and safety of processing chambers used in various industrial applications.

Latest Patents

One of his latest patents is titled "Process chamber lid and controlled exhaust." This invention describes a method and apparatus for efficiently exhausting harmful vapors and fumes from a substrate processing chamber. The processing chamber is designed with a lower volume configured as a liquid atmosphere and an upper volume as a gaseous atmosphere to contain vapors or fumes above the liquid. The apparatus includes a lid member that seals the processing chamber and a lid assembly that allows for the introduction of processing liquids while simultaneously exhausting harmful vapors. The invention also incorporates switchable valves and a variable source of negative pressure to provide controlled exhaust, effectively minimizing the escape of fumes.

Another significant patent by Scott Meyer is the "Wet clean system design." This invention provides an apparatus and method for processing and transferring substrates in a multi-chamber processing system. It allows for single substrate processing steps to be performed in parallel while leveraging the advantages of batch processing. The design aims to maximize system throughput, reduce costs, enhance reliability, and improve device yield on processed substrates.

Career Highlights

Scott Meyer is currently employed at Applied Materials, Inc., where he continues to innovate in the field of substrate processing. His work has significantly impacted the efficiency and safety of processing systems used in various industries.

Collaborations

Throughout his career, Scott has collaborated with notable colleagues, including Douglas Richards and Evanson G Baiya. These collaborations have contributed to the advancement of technology in substrate processing.

Conclusion

Scott Meyer is a distinguished inventor whose work in substrate processing technology has led to significant advancements in the field. His patents reflect a commitment to improving industrial processes and ensuring safety in substrate handling.

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