Company Filing History:
Years Active: 2019-2025
Title: Innovations of Scott Lewis
Introduction
Scott Lewis is a prominent inventor based in Manchester, GB. He has made significant contributions to the field of electronic components through his innovative patents. With a total of six patents to his name, Lewis has focused on enhancing the capabilities of electron beam lithography.
Latest Patents
One of his latest patents is the "Electron beam resist composition." This invention relates to an electron beam (eBeam) resist composition specifically designed for the fabrication of integrated circuits. The resist compositions include an anti-scattering compound that minimizes scattering and secondary electron generation, allowing for extremely high-resolution lithography. This high-resolution lithography can be applied directly to silicon-based substrates to produce integrated circuits or used to create a lithographic mask, such as a photomask, to facilitate high-resolution lithography.
Another notable patent is the "Secondary electron generating composition." This invention pertains to a resist composition intended for the production of electronic components via electron beam lithography. In addition to the standard base polymeric component, a secondary electron generator is included in the resist compositions. This unique combination increases the exposure sensitivity of the resists in a controlled manner, facilitating the effective production of high-resolution patterned substrates and electronic components at much higher write speeds.
Career Highlights
Scott Lewis is affiliated with The University of Manchester, where he continues to advance research in electronic components and lithography techniques. His work has garnered attention for its potential applications in the semiconductor industry.
Collaborations
Lewis has collaborated with notable colleagues, including Richard Winpenny and Stephen G Yeates, contributing to a dynamic research environment focused on innovation and development in electronic technologies.
Conclusion
Scott Lewis is a distinguished inventor whose work in electron beam lithography has the potential to revolutionize the production of electronic components. His innovative patents reflect a commitment to advancing technology in the field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.