The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2022
Filed:
Feb. 27, 2020
Applicant:
The University of Manchester, Manchester, GB;
Inventors:
Assignee:
The University of Manchester, Manchester, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 1/78 (2012.01); H01L 23/00 (2006.01); H01L 21/78 (2006.01); H01L 21/768 (2006.01); H01L 21/56 (2006.01); H01L 21/52 (2006.01); H01L 21/308 (2006.01); H01L 21/306 (2006.01); G03F 7/40 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0044 (2013.01); G03F 1/78 (2013.01); G03F 7/0042 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2059 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); H01L 21/3081 (2013.01); H01L 21/30604 (2013.01); H01L 21/52 (2013.01); H01L 21/563 (2013.01); H01L 21/76838 (2013.01); H01L 21/78 (2013.01); H01L 24/81 (2013.01); H01L 2224/8138 (2013.01);
Abstract
The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.