Manchester, United Kingdom

Richard Winpenny

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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6 patents (USPTO):Explore Patents

Title: Richard Winpenny: Innovator in Electron Beam Lithography

Introduction

Richard Winpenny is a notable inventor based in Manchester, GB. He has made significant contributions to the field of electron beam lithography, holding a total of six patents. His work focuses on enhancing the fabrication processes of integrated circuits through innovative resist compositions.

Latest Patents

Winpenny's latest patents include an electron beam resist composition and a secondary electron generating composition. The electron beam resist composition is designed for use in the fabrication of integrated circuits. It incorporates an anti-scattering compound that minimizes scattering and secondary electron generation, enabling extremely high-resolution lithography. This technology can be applied directly to silicon-based substrates or used to create lithographic masks, such as photomasks, for high-resolution lithography. The secondary electron generating composition is particularly useful in producing electronic components via electron beam lithography. It includes a secondary electron generator in the resist compositions, which enhances exposure sensitivity and facilitates the production of high-resolution patterned substrates at higher write speeds.

Career Highlights

Winpenny is affiliated with The University of Manchester, where he continues to advance research in electron beam lithography. His innovative approaches have positioned him as a key figure in the development of advanced resist materials for electronic applications.

Collaborations

He has collaborated with notable colleagues, including Scott Lewis and Stephen G Yeates, to further enhance the capabilities of electron beam lithography technologies.

Conclusion

Richard Winpenny's contributions to the field of electron beam lithography through his patents and research at The University of Manchester highlight his role as a leading innovator in the industry. His work continues to influence the development of high-resolution lithography techniques essential for modern electronics.

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