Company Filing History:
5 out of 13 
2 out of 622 
2 out of 13,713 
Years Active: 1998-2010
Title: Scott Lane: Innovator in Semiconductor Manufacturing Effluent Treatment
Introduction
Scott Lane is a notable inventor based in Chandler, AZ (US), recognized for his contributions to the field of semiconductor manufacturing. With a total of 9 patents to his name, Lane has made significant advancements in the treatment of effluent gases generated during semiconductor production processes.
Latest Patents
One of Lane's latest patents is an effluent gas stream treatment system designed for the oxidation treatment of semiconductor manufacturing effluent gases. This innovative system includes a pre-oxidation treatment unit, which may consist of a scrubber, an oxidation unit such as an electrothermal oxidizer, and a post-oxidation treatment unit, which can be a wet or dry scrubber. The system is engineered to utilize an integrated oxidizer, quench, and wet scrubber assembly to effectively abate hazardous or undesired components from the effluent gas stream. Additionally, the treatment system may incorporate gas or liquid shrouding of gas streams, facilitated by high-efficiency inlet structures.
Career Highlights
Throughout his career, Scott Lane has worked with several prominent companies, including Atmi Ecosys Corporation and Advanced Technology Materials, Inc. His experience in these organizations has contributed to his expertise in developing advanced technologies for environmental protection in semiconductor manufacturing.
Collaborations
Lane has collaborated with notable professionals in the industry, including Mark R. Holst and