Atmi Ecosys Corporation

Applied Materials, Inc.

Advanced Technology Materials, Inc.

Scott Lane

Mark R Holst

Kent H Carpenter

Prakash V Arya

Joseph D Sweeney

Jose I Arno

Eric Simpson

Ronald Colman

Dinesh Shah

Liam R Heading

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises an oxidation unit to which an oxygen-containing gas such as ozone may be added, with input of energy (e.g., thermal, radio frequency, electrical, microwave, etc.), to effect oxidation of oxidizable species in the effluent, such as halocompounds (e.g., chlorofluorocarbons, perfluorocarbons), CO, NF,, nitrogen oxides, and sulfur oxides). The effluent gas stream treatment system may include a wet scrubber associated with the oxygen-containing gas source, so that the gas stream is contacted with the oxygen-containing gas during the wet scrubbing operation, to enhance removal of oxidizable species in the gas stream during treatment.

Effluent gas stream treatment system having utility for oxidation

A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-Forming gas stream to a gas processing system. The structure is composed of a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween. The clog-resistant inlet structure is constructed, arranged, and operated so as to introduce a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.

Clog-resistant entry structure for introducing a particulate

A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a motive fluid driver constructed and arranged to receive the effluent gas stream from the process, and means for sensing a flow characteristic of the effluent gas stream and responsively adjusting the flow of the effluent gas stream to damp pressure fluctuations in the process. The flow stabilization system may further comprise: (i) a variable frequency drive for motively operating the motive fluid driver at a correspondingly variable rotational speed; (ii) a pressure transducer monitor for monitoring the flow characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller coupled in pressure transduced signal-receiving relationship with the pressure transducer monitor, and responsive to the pressure transduced signal to correspondingly adjust the variable frequency drive and responsively selectively drive the motive fluid driver to damp pressure fluctuations in the process. The system has applicability to stabilizing pressure-sensitive processes such as vapor phase coating and reaction processes in semiconductor manufacturing.

Flow-stabilized wet scrubber system for treatment of process gases from

A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system, including: a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween; and a flow passage for introducing a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to cause the gas to permeate through the gas-permeable wall to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.

A gas/liquid interface structure for transport of a gas stream from an upstream source of same to a downstream processing unit, comprising first and second flow passage members defining an annular volume therebetween, with the second flow passage member extending downwardly to a lower elevation than the lower end of the first flow passage member, with an outer wall member enclosingly circumscribing the second flow passage member and defining therewith an enclosed interior annular volume, and with a liquid flow port in the outer wall member for introducing liquid into the enclosed interior annular volume. The second flow passage member includes an upper liquid-permeable portion in liquid flow communication with the enclosed interior annular volume, whereby liquid from such volume can 'weep' through the permeable portion and form a falling liquid film on interior surface portions of the second flow passage member, as a protective liquid interface for the second flow passage member.

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Chandler, AZ, United States of America

Scott Lane