This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: University of Illinois. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Scott Daly: Innovator in Metal Complex Compositions
Introduction
Scott Daly is an accomplished inventor based in Urbana, Illinois. He has made significant contributions to the field of materials science, particularly in the development of metal complex compositions. His work focuses on creating advanced deposition agents for thin film structures and coatings.
Latest Patents
Scott Daly holds a patent for "Metal complex compositions and methods for making metal-containing films." This invention provides compositions of matter that are useful as deposition agents for creating structures, including thin film structures and hard coatings on various substrates. The patent details metal complexes that incorporate diboranamide or diboranaphosphide ligands, which serve as effective chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors. These precursors are designed to achieve high volatilities, enabling the production of dense, smooth, and homogeneous thin films and coatings.
Career Highlights
Scott Daly is affiliated with the University of Illinois, where he continues to advance research in materials science. His innovative approaches have garnered attention in the academic community, contributing to the understanding and application of metal complex compositions in various industries.
Collaborations
Scott has collaborated with notable colleagues, including Gregory S. Girolami and Do Young Kim. Their combined expertise has furthered research efforts in the field of chemical vapor deposition and materials engineering.
Conclusion
Scott Daly's contributions to the field of metal complex compositions highlight his role as a leading inventor in materials science. His innovative patent and collaborations with esteemed colleagues underscore the importance of his work in advancing technology and industry applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
