The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Apr. 09, 2008
Gregory S. Girolami, Urbana, IL (US);
DO Young Kim, Albany, CA (US);
John R. Abelson, Urbana, IL (US);
Navneet Kumar, Urbana, IL (US);
Yu Yang, Urbana, IL (US);
Scott Daly, Urbana, IL (US);
Gregory S. Girolami, Urbana, IL (US);
Do Young Kim, Albany, CA (US);
John R. Abelson, Urbana, IL (US);
Navneet Kumar, Urbana, IL (US);
Yu Yang, Urbana, IL (US);
Scott Daly, Urbana, IL (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
The present invention provides compositions of matter useful as deposition agents for making structures, including thin film structures and hard coatings, on substrates and features of substrates. In an embodiment, for example, the present invention provides metal complexes having one or more diboranamide or diboranaphosphide ligands that are useful as chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) precusors for making thin film structures and coatings. Metal complex CVD precursors are provided that possess volitilities sufficiently high so as to provide dense, smooth and homogenous thin films and coatings.