Urbana, IL, United States of America

Navneet Kumar

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: University of Illinois. Active years: 2011-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Navneet Kumar. Retrieved from https://idiyas.com/inventor/navneet-kumar-936a71kf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 2011-2014

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4 patents (USPTO):Explore Patents

Title: Innovations of Navneet Kumar

Introduction

Navneet Kumar is a prominent inventor based in Urbana, Illinois. He has made significant contributions to the field of thin film technology, holding a total of four patents. His work focuses on enhancing the quality and performance of thin films used in various applications, particularly in microelectronics.

Latest Patents

One of his latest patents is titled "Smoothing agents to enhance nucleation density in thin film chemical vapor deposition." This invention provides methods for creating nanosized and microsized thin film structures that exhibit a high degree of smoothness. These structures are particularly useful for applications in microelectronics. The deposition processes utilize smoothing agents that selectively adjust the rates of processes involved in thin film formation, resulting in enhanced nucleation densities and smooth thin film structures, including ultrathin films of less than 10 nm.

Another notable patent is "Metal complex compositions and methods for making metal-containing films." This invention offers compositions that serve as deposition agents for creating thin film structures and hard coatings on substrates. The metal complexes described in this patent include diboranamide or diboranaphosphide ligands, which are useful as chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors. These precursors possess high volatilities, enabling the production of dense, smooth, and homogeneous thin films and coatings.

Career Highlights

Navneet Kumar is affiliated with the University of Illinois, where he conducts research and development in the field of materials science. His innovative work has positioned him as a key figure in advancing thin film technologies.

Collaborations

Some of his notable coworkers include Gregory S. Girolami and John Abelson. Their collaborative efforts contribute to the ongoing research and development in the field of thin films and materials science.

Conclusion

Navneet Kumar's contributions to thin film technology through his patents and research at the University of Illinois highlight his role as an influential inventor in the field. His work continues to impact the microelectronics industry and advance the understanding of thin film formation and growth.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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