Company Filing History:
Years Active: 2001-2007
Title: Scott Chin: Innovator in Chemical-Mechanical Polishing Technology
Introduction
Scott Chin is a notable inventor based in Palo Alto, CA (US). He has made significant contributions to the field of chemical-mechanical polishing (CMP) technology, holding a total of 6 patents. His work has been instrumental in advancing the methods and apparatus used in semiconductor manufacturing.
Latest Patents
Among his latest patents, Scott Chin has developed an "Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure." This invention features a resilient pneumatic annular sealing bladder that is designed to enhance the polishing process by providing controlled pressure to the wafer. Another significant patent is the "Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring." This invention aims to achieve uniform polishing across the entire surface of a semiconductor wafer, ensuring high-quality results in semiconductor manufacturing.
Career Highlights
Scott Chin has worked with prominent companies in the industry, including Ebara Corporation and Mitsubishi Materials Corporation. His experience in these organizations has allowed him to refine his expertise in CMP technology and contribute to innovative solutions in the field.
Collaborations
Throughout his career, Scott has collaborated with notable professionals such as Gerard S. Maloney and John J. Geraghty. These collaborations have further enriched his work and have led to advancements in CMP technology.
Conclusion
Scott Chin's contributions to chemical-mechanical polishing technology have made a lasting impact on the semiconductor industry. His innovative patents and collaborations with industry leaders highlight his role as a key figure in advancing manufacturing processes.