Boise, ID, United States of America

Sau Ha Cheung

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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4 patents (USPTO):Explore Patents

Title: Innovations of Sau Ha Cheung

Introduction

Sau Ha Cheung is a notable inventor based in Boise, Idaho, recognized for his contributions to semiconductor technology. He holds a total of four patents, showcasing his expertise and innovative spirit in the field.

Latest Patents

One of his latest patents involves semiconductor formation using hybrid oxidation. This patent describes methods, apparatuses, and systems related to forming a semiconductor using hybrid oxidation. An example method includes forming an opening to create an isolation region in a semiconductor substrate. The method further includes depositing a first dielectric into the isolation region at a first oxidation rate, followed by depositing a second dielectric into the isolation region at a second oxidation rate. Another significant patent focuses on recessed access devices and methods of forming such devices. This method comprises forming a trench in semiconductor material, where the sidewalls and bottom of the trench are lined with low-k gate-insulator material. The low-k gate-insulator material is characterized by its dielectric constant k being no greater than 4.0. Sacrificial material is formed in a bottom portion of the trench over the low-k gate-insulator material and over the trench bottom. A high-k gate-insulator material is then formed in an upper portion of the trench above the sacrificial material and laterally inward of the low-k gate-insulator material. The high-k gate-insulator material is characterized by its dielectric constant k being greater than 4.0. The sacrificial material is eventually replaced with a conductive gate that has its top above the bottom of the high-k gate-insulator material. A pair of source/drain regions is formed in upper portions of the semiconductor material on opposing lateral sides of the trench, with a channel region in the semiconductor material below the pair of source/drain regions extending along the trench sidewalls and around the trench bottom.

Career Highlights

Sau Ha Cheung is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of semiconductor innovation. His work has significantly impacted the field, contributing to advancements in technology that are crucial for modern electronics.

Collaborations

He collaborates with talented individuals such as Sanh D Tang and Silvia Borsari, who contribute to the innovative environment at Micron Technology.

Conclusion

Sau Ha Cheung's work in semiconductor technology exemplifies the spirit of innovation and collaboration in the field. His patents reflect a deep understanding

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