San Jose, CA, United States of America

Satya Thokachichu

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.5

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):

Title: Innovations by Satya Thokachichu

Introduction

Satya Thokachichu is an accomplished inventor based in San Jose, CA. She has made significant contributions to the field of semiconductor processes, holding a total of 2 patents. Her work focuses on enhancing the efficiency and effectiveness of substrate supports and RF grounding configurations.

Latest Patents

One of her latest patents is titled "RF grounding configuration for pedestals." This invention relates to substrate supports for process chambers and RF grounding configurations. It describes methods of grounding RF current, involving a chamber body that defines a process volume, with electrodes strategically placed to optimize performance. The design includes an RF filter that enhances the grounding process, ensuring better functionality in semiconductor applications.

Another notable patent is "Selective deposition of hardmask." This invention addresses the selective deposition of substrates in semiconductor processes. By delivering RF power at high levels, such as greater than 4.5 kW, the invention improves plasma coupling to the electrode. This results in selective deposition on the substrate while minimizing unwanted deposition on other areas of the process chamber, thus increasing throughput and reducing cleaning time.

Career Highlights

Satya Thokachichu is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her innovative work has positioned her as a key contributor to advancements in semiconductor technology.

Collaborations

Throughout her career, Satya has collaborated with notable colleagues, including Edward P Hammond and Viren Kalsekar. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Satya Thokachichu's contributions to the field of semiconductor processes through her patents demonstrate her innovative spirit and technical expertise. Her work continues to influence advancements in the industry, making her a significant figure in the realm of inventions.

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