This inventor holds 2 USPTO granted patents. Top assignee: Hitachi Plant Technologies, Ltd.. Active years: 2008-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kitakannbara-gun, JP (2008)
- Niigata, JP (2011)
Company Filing History:
Years Active: 2008-2011
Title: Satoshi Yawata: Innovator in Substrate Holding Technologies
Introduction
Satoshi Yawata is a notable inventor based in Niigata, Japan. He has made significant contributions to the field of substrate holding technologies, with a focus on methods that enhance efficiency and ease of use in vacuum environments. His innovative approaches have led to the development of two patents that showcase his expertise and creativity.
Latest Patents
Satoshi Yawata holds two patents that reflect his innovative work. The first patent is titled "Method for holding substrate in vacuum." This method involves using a glass substrate held by an adhesive pad or adhesive sheet made from a material containing a diene-based resin. This design prevents adhesive agents from remaining on the substrate, allowing for easy detachment after assembly. The second patent, "Substrate holding device including adhesive face with hexagons defined by convex portions," shares similar principles, emphasizing the effectiveness of his adhesive solutions in vacuum applications.
Career Highlights
Satoshi Yawata is currently employed at Hitachi Plant Technologies, Ltd., where he continues to develop and refine his innovative ideas. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to substrate technology.
Collaborations
Some of Satoshi's coworkers include Naoto Yokoyama and Mitsuaki Morimoto. Their collaboration has fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Satoshi Yawata's contributions to substrate holding technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials and methods that improve efficiency in vacuum applications. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile