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Years Active: 2018-2022
Title: Satoshi Terakura: Innovator in Plasma Processing Technology
Introduction
Satoshi Terakura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on improving plasma etching methods, which are crucial in various industrial applications.
Latest Patents
Terakura's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus is designed to implement a plasma etching method that enhances the tapered shape of materials. It features a processing chamber for plasma processing, a first radio frequency power source for generating plasma, a sample stage for placing the sample, a second radio frequency power source for the sample stage, and a control unit that manages both power sources. This apparatus is capable of etching stacked films made of silicon oxide and polycrystalline silicon or silicon nitride using a plasma generated from a mixed gas of hydrogen bromide, hydrofluorocarbon, and nitrogen-containing gases.
The plasma processing method he developed allows for consistent processing with high selectivity and etching rates when working with laminated films that include boron-containing amorphous carbon. This method simplifies the mask forming process, thereby increasing throughput and ensuring shape controllability during vertical processing.
Career Highlights
Throughout his career, Satoshi Terakura has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has contributed to his expertise in plasma processing technologies.
Collaborations
Some of his notable coworkers include Masahito Mori and Takao Arase. Their collaborative efforts have further advanced the field of plasma processing.
Conclusion
Satoshi Terakura's innovative work in plasma processing technology has led to significant advancements in the industry. His patents reflect a commitment to improving etching methods and apparatuses, showcasing his role as a key inventor in this specialized field.