Tokyo, Japan

Satoshi Oku


 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Satoshi Oku

Introduction

Satoshi Oku is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly through his innovative patent. His work exemplifies the intersection of creativity and technical expertise.

Latest Patents

Satoshi Oku holds a patent for a "Standard sample and manufacturing method thereof." This invention involves a substrate that is etched using a process that takes advantage of crystal anisotropy. The etching creates a recess that extends from the main surface of the substrate into its interior. The side surface of this recess is nearly a (111) plane, which allows for minimal etching progression. Consequently, the cross-section of the recess, when viewed perpendicularly to its longitudinal direction, takes on a rectangular shape. The mask pattern's opening is also rectangular, resulting in a recess that forms a rectangular parallelepiped shape. This design includes a side surface that is perpendicular to the main surface of the substrate and features a facet surface tilted from the (111) plane.

Career Highlights

Satoshi Oku is currently employed at NTT Advanced Technology Corporation, where he continues to push the boundaries of innovation. His work at this esteemed company has allowed him to explore various technological advancements and contribute to the development of cutting-edge solutions.

Collaborations

Throughout his career, Satoshi has collaborated with talented individuals such as Akira Kodaira and Takashi Maruyama. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of groundbreaking inventions.

Conclusion

Satoshi Oku's contributions to technology through his patent and work at NTT Advanced Technology Corporation highlight his innovative spirit and dedication to advancing the field. His achievements serve as an inspiration for future inventors and innovators.

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