The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
May. 14, 2020
Ntt Advanced Technology Corporation, Tokyo, JP;
NTT ADVANCED TECHNOLOGY CORPORATION, Tokyo, JP;
Abstract
A substrate () is etched by etching processing with crystal anisotropy, thereby forming a recess () from the main surface of the substrate () to the inside of the substrate (). A side surface () is almost a (111) plane, and the etching hardly progresses. As a result, a cross section of the recess () perpendicular to the longitudinal direction has a rectangular shape. Since an opening () of a mask pattern () has a rectangular shape in a planar view, the opening of the recess () has a rectangular shape in a planar view, and the recess () is formed into, for example, a rectangular parallelepiped shape. The recess () includes a side surface () that forms one plane perpendicular to the main surface of the substrate (). The side surface () is a facet surface and is a tilting surface tilted from the (111) plane.