This inventor holds 1 USPTO granted patent. Top assignee: Canon Anelva Corporation. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Satoshi Negishi: Innovator in Load Lock Technology
Introduction
Satoshi Negishi is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of load lock devices, which are essential in various processing environments. His innovative approach has led to the development of a unique patent that enhances the efficiency of substrate handling.
Latest Patents
Negishi holds a patent for a load lock device that includes a load lock chamber with a first conveyance port connected to a transfer chamber and a second conveyance port linked to a loader chamber. The device features a substrate holder designed to hold a substrate within the load lock chamber. A driving mechanism positioned below the load lock chamber allows for the vertical movement of the substrate holder. Additionally, the device includes an extension chamber that extends from the lower portion of the load lock chamber, along with a pump that discharges gas from the load lock chamber through the extension chamber. This innovative design improves the overall functionality and efficiency of the load lock system.
Career Highlights
Satoshi Negishi is currently employed at Canon Anelva Corporation, where he continues to work on advancements in load lock technology. His expertise and innovative mindset have made him a valuable asset to the company.
Collaborations
Negishi has collaborated with notable colleagues, including Jun Miura and Naoya Fukuda. Their combined efforts have contributed to the development of cutting-edge technologies in their field.
Conclusion
Satoshi Negishi's contributions to load lock technology exemplify his innovative spirit and dedication to advancing the industry. His patent and work at Canon Anelva Corporation highlight his role as a key figure in the field of substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile