Kanagawa, Japan

Satoshi Nakamura

This inventor holds 57 USPTO granted patents and 9 published patent applications and 3 EPO patents, primarily in Image Processing (CPC class G06T). Top assignees: Ricoh Company, Ltd., Fuji Xerox Co., Ltd., Sony Corporation. Active years: 1989-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Nakamura. Retrieved from https://idiyas.com/inventor/satoshi-nakamura-skwut1vi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 57 

% Patents Active = 73.7


Average Co-Inventor Count = 1.8

ph-index = 8

Forward Citations = 180(Granted Patents)

Forward Citations (Not Self Cited) = 168(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Tokyo-to, JP (2018 - 2019)
  • Kanagawa, JP (1989 - 2023)
  • Chiba, JP (2011 - 2024)

Company Filing History:


Years Active: 1989-2026

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Areas of Expertise:
Image Processing
Hemicellulase Compositions
Transport Device
Surveying Instrument
Reflective Mask Cleaning
Information Display
Alignment Apparatus
Electric Information Processing
Image Forming Apparatus
Ultrasonic Motor
Patterned Ground Structure
Simulation Method
57 patents (USPTO):Explore Patents

Title: Innovations of Satoshi Nakamura: Pioneering Patents in Alignment and Cleaning Technologies

Introduction

Satoshi Nakamura, hailing from Kanagawa, Japan, is a notable inventor recognized for his significant contributions to the field of technology, with 54 patents to his name. His work has focused on advancements in alignment and reflective mask cleaning technologies, showcasing his innovative approach and technical expertise.

Latest Patents

Nakamura's latest patents include sophisticated systems and methods for alignment and cleaning. One of his notable inventions is an alignment apparatus that comprises mechanisms to acquire and transform point cloud data. The apparatus facilitates the determination of a final solution from various candidate transformations, enhancing precision in data alignment.

Another groundbreaking patent details a reflective mask cleaning apparatus designed to clean ruthenium-containing capping layers. This invention utilizes a dual supply structure to deliver cleaning solutions, using both organic solvents and plasma products. The careful method of combining reducing and oxygen-free solutions highlights an advanced understanding of materials and cleaning processes.

Career Highlights

Throughout his career, Satoshi Nakamura has significantly impacted the technology sector through his employment at renowned companies such as Ricoh Company, Ltd., and Fuji Xerox Co., Ltd. These experiences have allowed him to hone his skills and contribute to cutting-edge innovations in imaging and optical technologies.

Collaborations

Nakamura has worked alongside esteemed colleagues, including Yasuto Okabayashi and Yoshihiko Tokuda. Their collaborative efforts have further propelled advancements in their respective fields, demonstrating the power of teamwork in nurturing innovation.

Conclusion

Satoshi Nakamura stands out as a prominent figure in the realm of inventions, particularly in alignment and cleaning technologies. His extensive patent portfolio and collaborative spirit underscore his commitment to pushing the boundaries of innovation, ultimately benefiting the industry and society at large.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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