Nagaoka, Japan

Satoshi Nakamura

This inventor holds 1 USPTO granted patent. Top assignees: Canon Kabushiki Kaisha, Canon Tokki Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoshi Nakamura. Retrieved from https://idiyas.com/inventor/satoshi-nakamura-mnugjcxg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Satoshi Nakamura: Innovator in Film Deposition Technology

Introduction

Satoshi Nakamura is a notable inventor from Nagaoka, Japan, recognized for his contributions to film deposition technology. He holds a patent that showcases his innovative approach to enhancing film deposition processes.

Latest Patents

Nakamura's patent, titled "Film deposition apparatus and film deposition method," describes a sophisticated apparatus designed for efficient film deposition. The apparatus includes a vacuum chamber, a cylindrical target positioned opposite a substrate, and a driving unit that rotatively drives the target. Additionally, it features a magnetic field creator, a reactive gas flow unit, and an optical emission monitor. The controlling unit is designed to adjust the rotation speed of the target to ensure that the monitored optical emission intensity aligns with a preset target intensity.

Career Highlights

Throughout his career, Satoshi Nakamura has worked with prominent companies, including Canon Tokki Corporation and Canon Kabushiki Kaisha. His experience in these organizations has significantly contributed to his expertise in the field of film deposition technology.

Collaborations

Nakamura has collaborated with esteemed colleagues such as Yasuo Murakami and Kazuhiro Hoshino, further enhancing his work and contributions to the industry.

Conclusion

Satoshi Nakamura's innovative work in film deposition technology and his patent demonstrate his significant impact on the field. His collaborations and career at leading companies highlight his expertise and dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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