The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Apr. 19, 2016
Canon Tokki Corporation, Niigata, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Yasuo Murakami, Fujisawa, JP;
Kazuhiro Hoshino, Utsunomiya, JP;
Toru Sato, Ebina, JP;
Takashi Takemi, Nagaoka, JP;
Satoshi Nakamura, Nagaoka, JP;
Tomohiro Kumaki, Nagaoka, JP;
Canon Tokki Corporation, Niigata, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A film deposition apparatus comprises: a vacuum chamber; a cylindrical target, a circumferential surface of the target being opposite to a substrate, and the target being disposed in the vacuum chamber so as to intersect a conveyance direction of the substrate; a driving unit configured to rotatively drive the target; a magnetic field creator disposed inside the target; a reactive gas flow unit configured to flow a reactive gas, the reactive gas flow unit being disposed in the vicinity of the target; an optical emission monitor configured to monitor an optical emission intensity of plasma at a location between the substrate and the target and in the vicinity of the target; and a controlling unit configured to control a rotation speed of the target driven by the driving unit, such that the optical emission intensity monitored by the optical emission monitor approaches a preset target optical emission intensity.